Nanoscale measurement standard device obtains national utility model patent authorization

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With the rapid development of nanotechnology, high-resolution measuring instruments for measuring nanoscale have been a subject of concern. In order to obtain more accurate measurement results, it is necessary to have a standard substance that is closer to the sample size. The nanoscale measurement standard developed by the Tianjin Inspection and Quarantine Bureau has obtained the national utility model patent authorization. The product adopts international advanced focused ion beam etching technology, featuring high resolution, uniform line spacing, stable materials, unique design, etc., which can meet the needs of comparative measurement of samples of different shapes and effectively solve the more accurate measurement of nanometer scale. The problem has filled the domestic blank of the standard device in the field of nanomaterials and reached the international advanced level.

According to reports, the nanometer etalon has high resolution and has a standard periodic line spacing of 78 nanometers, which is much smaller than the currently recognized 1000 line spacing of the S1000 standard device. It is a nanometer standard etalon in the true sense, and can guarantee each scale. The uniformity and consistency of the period line spacing make the distance of the integer multiple of the minimum line spacing comparable to the standard length. The material has low expansion coefficient and stable performance. The design will be horizontal line, vertical line, lattice and ring shape. The standard scale is integrated to meet the needs of the measurement of different shapes of the sample.

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